Branching and fringing in microstructure electron flow
Publication information:
Shaw, S. Branching and fringing in microstructure electron flow. International Journal of Modern Physics B 17, 3977–3987 (2003).
Abstract
Recent experimental work in the Westervelt laboratory at Harvard has succeeded in directly imaging electron flow in two degree of freedom electron gasses formed in semiconductor microstructures. Here, we give a brief account of the unexpected high resolution of the resulting images, the surprising branching of the flow which was observed, and the survival of quantum fringing beyond where it was thought to have been obliterated by thermal effects.